发明名称 CIRCUIT PATTERN FORMATION METHOD, PHOTOMASK, PHOTOMASK PRODUCTION METHOD, AND PRODUCTION METHOD OF ELECTRIC ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a circuit pattern formation method, in which a substrate on which a circuit pattern is formed, can be produced by mass production.SOLUTION: A circuit pattern formation method comprises: a step S2 for performing pretreatment for molecule adhesion to a substrate 12 on which a non-flat surface 13 is formed; a step S5 for adhering a conductor 14 to the non-flat surface of the substrate 12 which has been subjected to pretreatment; and a step S7 for, using a photomask PM having a shape corresponding to the non-flat surface, and forming a circuit pattern on the non-flat surface 13 by photo lithography.SELECTED DRAWING: Figure 1
申请公布号 JP2016090795(A) 申请公布日期 2016.05.23
申请号 JP20140224790 申请日期 2014.11.04
申请人 HOHKOHSYA:KK 发明人 KURAMITSU SHUICHI;OKAMOTO TOMOMI;FUMOTO MASATOSHI;KUSUKI HIRONORI
分类号 G03F7/24;B23K26/382;B29C43/00;B29C51/10;G03F1/88;H01L21/027 主分类号 G03F7/24
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