发明名称 |
CIRCUIT PATTERN FORMATION METHOD, PHOTOMASK, PHOTOMASK PRODUCTION METHOD, AND PRODUCTION METHOD OF ELECTRIC ELECTRONIC APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a circuit pattern formation method, in which a substrate on which a circuit pattern is formed, can be produced by mass production.SOLUTION: A circuit pattern formation method comprises: a step S2 for performing pretreatment for molecule adhesion to a substrate 12 on which a non-flat surface 13 is formed; a step S5 for adhering a conductor 14 to the non-flat surface of the substrate 12 which has been subjected to pretreatment; and a step S7 for, using a photomask PM having a shape corresponding to the non-flat surface, and forming a circuit pattern on the non-flat surface 13 by photo lithography.SELECTED DRAWING: Figure 1 |
申请公布号 |
JP2016090795(A) |
申请公布日期 |
2016.05.23 |
申请号 |
JP20140224790 |
申请日期 |
2014.11.04 |
申请人 |
HOHKOHSYA:KK |
发明人 |
KURAMITSU SHUICHI;OKAMOTO TOMOMI;FUMOTO MASATOSHI;KUSUKI HIRONORI |
分类号 |
G03F7/24;B23K26/382;B29C43/00;B29C51/10;G03F1/88;H01L21/027 |
主分类号 |
G03F7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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