| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern.SOLUTION: The resist composition generates an acid by exposure and shows changes in the solubility with a developer by an action of an acid. The composition comprises a base component (A) whose solubility with a developer changes by an action of an acid, and an acid diffusion controller component (D). The base component (A) comprises a resin component having a structural unit (a0) represented by general formula (a0-1) and a structural unit (a2) derived from an acrylate monomer having a logP value of less than 1.2. The acid diffusion controller component (B) has an acid dissociation constant of 1.5 or more. In the formula, R represents H, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms; Ya represents C; Xa represents an atomic group necessary to form an alicyclic hydrocarbon group together with Ya; and Rarepresents an aromatic hydrocarbon group optionally having a substituent.SELECTED DRAWING: None |
