| 摘要 |
PURPOSE:To enable the title ink jet head to cope with densification and miniaturization by forming a highly precise and fine passage substrate by a method wherein a pressure chamber, a discharge opening part, and a supply opening part of the ink jet head are irradiated with ultraviolet laser beam through a mask pattern. CONSTITUTION:An ink passage is written in a mask 12, and a pattern is formed by art etching method. Then, a pressure chamber 3, an ink discharge opening part 5, and a supply opening part 7 are formed with an excimer laser, and an ink discharge opening 4 is formed by irradiating it from a direction (a) or (c) with the excimer laser. Further, a supply opening 6 is formed by irradiating it from directions (b), (c) in the same way, and a passage substrate 1 can be obtained. Herein, in the case where the ink discharge opening 4 or the supply opening 6 is fabricated from the direction (c) with the excimer laser, it may be formed simultaneously when the pressure chamber 3, the ink discharge opening part 5, and the supply opening part 7 are formed. Since precision in a master pattern can be transferred as it is onto the passage substrate when the passage is formed thus, a fine ink passage can be formed highly precisely in a short time. |
