| 摘要 |
<p>PURPOSE:To provide the method for forming a relief pattern which can easily form the relief pattern having a smooth stereoscopic feel with a line drawing as motif. CONSTITUTION:A width W is defined at a segment L forming the line drawing to be motif to obtain edge lines a, b. A reference line, such as segment AB, is defined to a multiplicity at equal intervals. The intersected points P1, P2 of the segment AB and the edge lines a, b are determined. Inflection points Q1, Q2 are defined in the positions apart prescribed distance S1, S2 and peak points T1, T2 are defined above prescribed heights h1, h2. The segment A-Q1, segment Q1-T1, segment T1-T2, segment T2-Q2, segment Q2-B are respectively connected, by which one piece of the multiparallel line is constituted. The distances S1, S2, the heights h1, h2 are set at the values varying with the respective parts of the reference lines by taking the pattern of the motif into consideration. The multiparallel lines are constituted with each of the many reference lines and the relief pattern is constituted by the many multiparallel lines.</p> |
