GLASS MASK AND MANUFACTURE OF SEMICONDUCTOR DEVICE BY USING THIS GLASS MASK

摘要

PURPOSE:To enable the reduction of the width of a space constituting the patterns of a resist mask by using the glass mask which does not generate the mis-registration between reticules and the glass mask. CONSTITUTION:The glass mask formed with the 1st reticule and the 2nd reticule is mounted to an exposing device. A photoresist 40 is exposed by the 1st reticule 73. A semiconductor substrate 10 formed with the photoresist 40 is moved by using the X-Y stage of the exposing device and the photoresist 40 is exposed by the 2nd reticule. The photoresist 40 is thereafter developed, by which the resist mask 80 is formed.