| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent a workpiece from being heated with transmitted heat from a photomask involving quantum dots in an exposure device used for near field optical lithography. <P>SOLUTION: The upper surface of the mask substrate of the photomask 1 involving quantum dots is irradiated with light from a flash lamp of a light source 20, and near field light oozes out to a neighbourhood of an opening of a light shielding film 2 formed on the photomask 1 to expose a resist layer 11 on the surface of the workpiece located just under the opening. Although the quantum dots involved in the photomask 1 absorb and emit light, heat is, at that time, produced in accordance with an energy difference between the wavelength of the irradiated light and the wavelength of the light emitted from the quantum dots. It is possible by using the flash lamp to achieve exposure processing in a short time, to finish the exposure processing until the heat is transferred to a surface of the photomask substrate on the side of the resist layer, and to prevent the heating of the resist layer by the heat. <P>COPYRIGHT: (C)2007,JPO&INPIT |
