发明名称 FORMATION OF PATTERN
摘要 PURPOSE:To enable certain separation of a pattern from an adjacent pattern by forming a protuberant pattern in advance under the layer to be processed, and transferring the small interval of said patterns just on said protuberant pattern. CONSTITUTION:A protuberant pattern 8 is formed on a substrate 1 in advance at the position at which the small interval of the patterns adjacent to each other is later to be formed. Then, the layer 2 to be processed is formed, and this layer 2 is coated with a photosensitive resin film 3, e.g. by a spin coating method. Thickness of the part of the film 3 just above the protuberant pattern 8 is considerably small as compared with that of the other part. Then, ordinary exposure and development steps are carried out. Development is finished at the small interval 5 almost at the same time as at a large interval 4. As a result, the interval of adjacent patterns can be separated with certainty.
申请公布号 JPS59231535(A) 申请公布日期 1984.12.26
申请号 JP19830108155 申请日期 1983.06.14
申请人 MITSUBISHI DENKI KK 发明人 ITAKURA HIDEAKI
分类号 G03F7/26;G03F7/09;H01L21/027;(IPC1-7):G03C5/00;G03F7/00 主分类号 G03F7/26
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