CLEANING METHOD AND SOLVENT FOR REMOVING RESIDUE COMPOSITIONS CONTAINING BOTH POLAR AND NON-POLAR MATERIALS

摘要

A process for cleaning both polar and non-polar residue material from screening masks, wherein the mask is contacted with a liquid solvent that at least includes a solvent selected from the group consisting of N-Cyclohexyl-2-Pyrrolidone, N-Isopropyl-2-Pyrrolidone, Ethyl Hexyl Acetate, Dibutyl Cartitol and MAGIE OIL #543.