发明名称 Process for producing shaped bodies of silicon dioxide
摘要 A shaped body of amorphous silicon dioxide, which has a chemical purity of at least 99.9% and a cristobalite content of at most 1% and which is impermeable to gas, is known. To provide shaped bodies of amorphous silicon dioxide which have a high precision, which can be small or large in size and of simple to complicated shape, which have a chemical purity of at least 99.9%, are impermeable to gas above wall thicknesses of 1 mm, which have a high cold flexural strength, low thermal conductivity and low radiation of heat, which are thermal shock resistant and can be exposed repeatedly or also long-term to temperatures in the range from 1000 DEG to 1300 DEG C. and which can be welded in a sharply delineated manner without spreading joins and which have a low spectral transmission from the ultraviolet to the middle infrared spectral region, the shaped body is opaque, contains pores, at a wall thickness of 1 mm has a direct spectral transmission which is virtually constant in the wavelength range from lambda =190 nm to lambda =2650 nm and is below 10%, and it has a density which is at least 2.15 g/cm3. A process for producing such shaped bodies is also provided.
申请公布号 US5866062(A) 申请公布日期 1999.02.02
申请号 US19970814713 申请日期 1997.03.11
申请人 HERAEUS QUARZGLAS GMBH 发明人 MORITZ, STEPHAN;ENGLISCH, WOLFGANG
分类号 B22C9/12;C03B19/06;C03C3/06;C03C11/00;C30B35/00;(IPC1-7):C04B33/28 主分类号 B22C9/12
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