| 摘要 |
A scanning exposure apparatus has a wafer stage (7), a reticle stage (5), projection optical system (9) for projecting the image of a reticle (4) onto a substrate (6) on the wafer stage (7), X-Y laser interferometers (17) for measuring the position of the wafer stage (7) in the X direction, Z interferometers (16) for measuring the wafer stage position in the Z direction, and X-Y laser interferometers (41) for measuring the position of the reticle stage (5) in the X and Y directions, and transfers the image of the reticle (4) onto the wafer (6) by exposure while synchronously driving the wafer stage (7) and reticle stage (5). The exposure apparatus includes a plurality of laser heads (110-1 - 110-3) for generating laser beams to be provided to the interferometers. A reference signal (ref-in) is supplied from one laser head (110-1) to the remaining laser heads (110-2, 110-3) to synchronize all laser heads. <IMAGE>
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