发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a photosensitive resin composition capable of providing a hardened film superior in heat resistance, close adhesiveness, low water absorptivity, mechanical characteristics, and the like and high in performance by incorporating a specified resin and an epoxy resin, a photopolymerization initiator, and an inorganic filler specified in content. SOLUTION: This photosensitive resin composition comprises (A) a resin having carboxylic groups and ethylenically unsaturated groups, (B) an epoxy resin, (C) a photopolymerization initiator, and (D) an inorganic filler in an amount of 50-85 weight %, preferably 50-65 weight % of the total solid components, and when this content is than 50 weight %, reflow and PCT resistances and warping property deteriorate, and is not desirable, where as if it exceeds 85 weight %, coatability and photocurability and the like are deteriorated, so that this is not desirable.
申请公布号 JP2000181058(A) 申请公布日期 2000.06.30
申请号 JP19980359879 申请日期 1998.12.18
申请人 HITACHI CHEM CO LTD 发明人 YOSHINO TOSHIZUMI;HIRAYAMA TAKAO;SATO KUNIAKI;ITO TOSHIHIKO;HIRAKURA HIROAKI
分类号 H05K3/06;G03F7/004;G03F7/027;G03F7/038 主分类号 H05K3/06
代理机构 代理人
主权项
地址