| 摘要 |
PROBLEM TO BE SOLVED: To provide the exposure method of an aligner that can conduct exposure of a whole substrate quickly by aligning the substrate and a mask accurately with a short process time. SOLUTION: The exposure method of an aligner aligns a substrate having an alignment mark with a mask having a mask mark and a prescribed pattern, and conducts exposure with the mask closely contacting the substrate. It is composed of a step to find proportionally divided points MA and MB where diagonal lines starting from the mask marks of a half area and the whole of the mask cross respectively, a step to find proportionally divided points WA and WB where diagonal lines starting from the alignment marks of a half area and the whole of the substrate cross respectively, a comparison step to compare the proportionally divided points MB and WB, a judgment step to judge whether the proportionally divided point WB is within a tolerance range to the proportionally divided point MB from the comparison step, and a step to cast an exposure light over the whole of the substrate when the WB is judged as within the tolerance range in the judgement step. COPYRIGHT: (C)2005,JPO&NCIPI
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