发明名称 |
SEMICONDUCTOR DEVICE HAVING TRIPLE GATE TRANSISTOR, AND MANUFACTURING METHOD OF THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor having a triple gate transistor, and to provide a manufacturing method of the same. SOLUTION: In the semiconductor capable of reducing NBTI and the manufacturing method of the same, a multi-gate transistor includes an active region; a gate insulating film, and channels and electrodes in the active region and is formed on a semiconductor wafer; the active region has upper and both sides and is formed in a first direction; the gate insulating film is formed on the upper and both sides in the active region; the channels are formed on the upper and both sides in the active region; and the gate electrodes are formed on the gate insulating film corresponding to the channels, wherein an SOI layer having a second directional indicator in a second direction is formed on a support substrate, having a first directional indicator in the first direction. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2005236305(A) |
申请公布日期 |
2005.09.02 |
申请号 |
JP20050042948 |
申请日期 |
2005.02.18 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
MAEDA SHIGENOBU;YANG JEONG-HWAN;CHOI JUNGA |
分类号 |
H01L21/336;H01L21/84;H01L27/12;H01L29/78;H01L29/786;(IPC1-7):H01L29/78 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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