发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition used for projection formation for a vertical alignment liquid crystal element having superior voltage holding characteristics in a curing matter by making alkali development good. <P>SOLUTION: The photosensitive resin composition (Q) capable of alkali development used for projection formation for the vertical alignment liquid crystal display element contains: a hydrophilic resin (A) containing a (meta)acryloyl group modifying an epoxy resin and a carboxyl group; a compound (B) having a functional group selected from a group consisting of an alkoxy methyl group, a methylol group, an imino group, an oxazoline group, a glycidyl group, an isocyanate group, and a block isocyanate group; and a radical photopolymerization-initiator (C). <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009134281(A) 申请公布日期 2009.06.18
申请号 JP20080277588 申请日期 2008.10.29
申请人 SANYO CHEM IND LTD 发明人 YAMAMOTO YUSUKE;YAMAZAKI TAKURO
分类号 G02F1/1337;C08F299/02;G03F7/004;G03F7/027;G03F7/40 主分类号 G02F1/1337
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