| 发明名称 | Photoresist monomer, photoresist and method for the preparation thereof, color filter | ||
| 摘要 | A photoresist monomer, a photoresist and a method for the preparation thereof, a color filter. The photoresist monomer has a structure represented by Formula I,;wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4. The resulting photoresist exhibits a compact and smooth surface and a gentle angle of slope. | ||
| 申请公布号 | US9365505(B2) | 申请公布日期 | 2016.06.14 |
| 申请号 | US201314381746 | 申请日期 | 2013.12.13 |
| 申请人 | BOE TECHNOLOGY GROUP CO., LTD | 发明人 | Wang Xuelan;Tang Chen |
| 分类号 | G03F7/027;G03F7/031;G02B5/20;C07C309/73;G03F7/00;G03F7/004;C07C303/26;G02B5/22 | 主分类号 | G03F7/027 |
| 代理机构 | Collard & Roe, P.C. | 代理人 | Collard & Roe, P.C. |
| 主权项 | 1. A photoresist monomer having a structure represented by Formula I, wherein, R1 is hydrogen or methyl; R2 is hydrogen, methyl, ethyl, or propyl; R3 is hydrogen or C1-6 alkyl; and n is from 1 to 4, wherein, in Formula I, m1, m2, and m3 are in the range of 50-400. | ||
| 地址 | Beijing CN | ||