Full-field maskless lithography projection optics

摘要

Projection optics for a lithographic projection system is provided that comprises a spatial light modulator (SLM) from which radiation is reflected and directed to a projection lens that projects the radiation to a substrate. The SLM is illuminated by non telecentric off axis illumination (e.g. from laser radiation that has a spectral bandwidth of the order of 1 picometer, and the projection optics is configured for significant reduction (e.g. at least 10× reduction, 20× reduction, or 50× reduction).

主权项

1. A projection optics for a lithographic projection system, comprising:
a catadioptric projection lens with at least one concave mirror, and optical elements between an image plane and the at least one concave mirror, wherein the projection optics is an object-side non-telecentric optical system, configured to provide an image reduction by at least a factor of 10 and to satisfy the following condition:
4