发明名称 |
POSITIVE RESIST COMPOSITION |
摘要 |
A positive resist composition comprising a quinonediazide compound and an alkali-soluble resin containing resin (A) obtainable through a condensation reaction of at least one compound represented by the general formula (I): (I) wherein R1, R2 and R3 independently of one another each represent a hydrogen atom or an alkyl or alkoxy group having 1-4 carbon atoms and k represents 1 or 2, at least one polyphenol compound represented by the general formula (II): (II) wherein R4' to R6' each represent a hydrogen atom or an alkyl or alkoxy group and n represents 1 or 2, with an aldehyde compound. This positive resist composition is excellent in properties such as profile, resolution, heat resistance, etc. and nearly completely free from scum.
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申请公布号 |
CA2096213(A1) |
申请公布日期 |
1993.11.28 |
申请号 |
CA19932096213 |
申请日期 |
1993.05.13 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
NAGASE, KYOKO;OSAKI, HARUYOSHI;HASHIMOTO, KAZUHIKO;MORIUMA, HIROSHI |
分类号 |
G03F7/022;C08G8/04;G03F7/023;H01L21/027;(IPC1-7):G03F7/039 |
主分类号 |
G03F7/022 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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