发明名称 |
Thin film transistor array panel and manufacturing method thereof |
摘要 |
A thin film transistor array panel is provided, which includes: a gate line, a gate insulating layer, and a semiconductor layer sequentially formed on a substrate; a data line and a drain electrode formed at least on the semiconductor layer; a first passivation layer formed on the data line and the drain electrode and having a first contact hole exposing the drain electrode at least in part; a second passivation layer formed on the first passivation layer and having a second contact hole that is disposed on the first contact hole and has a first bottom edge placed outside the first contact hole and a second bottom edge placed inside the first contact hole; and a pixel electrode formed on the second passivation layer and connected to the drain electrode through the first and the second contact holes.
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申请公布号 |
US7190000(B2) |
申请公布日期 |
2007.03.13 |
申请号 |
US20040915958 |
申请日期 |
2004.08.11 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
RYU HYE-YOUNG;YOO YOUNG-HOON;KIM JANG-SOO;KIM SUNG-MAN;KIM KYUNG-WOOK;KONG HYANG-SHIK;SONG YOUNG-GOO |
分类号 |
H01L29/04;H01L21/77;H01L21/84;H01L27/12 |
主分类号 |
H01L29/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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