发明名称 Thin film transistor array panel and manufacturing method thereof
摘要 A thin film transistor array panel is provided, which includes: a gate line, a gate insulating layer, and a semiconductor layer sequentially formed on a substrate; a data line and a drain electrode formed at least on the semiconductor layer; a first passivation layer formed on the data line and the drain electrode and having a first contact hole exposing the drain electrode at least in part; a second passivation layer formed on the first passivation layer and having a second contact hole that is disposed on the first contact hole and has a first bottom edge placed outside the first contact hole and a second bottom edge placed inside the first contact hole; and a pixel electrode formed on the second passivation layer and connected to the drain electrode through the first and the second contact holes.
申请公布号 US7190000(B2) 申请公布日期 2007.03.13
申请号 US20040915958 申请日期 2004.08.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 RYU HYE-YOUNG;YOO YOUNG-HOON;KIM JANG-SOO;KIM SUNG-MAN;KIM KYUNG-WOOK;KONG HYANG-SHIK;SONG YOUNG-GOO
分类号 H01L29/04;H01L21/77;H01L21/84;H01L27/12 主分类号 H01L29/04
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