PATTERN INSPECTION SYSTEM

摘要

Pattern inspection system for patterns (1a) formed on a substrate (1) such as photo mask by means of laser beam scanning. The system includes means (10, 11) for detecting pattern states in a plurality of separate directions, a memory device (12) having a plurality of memory units for storing the pattern states detected separately, and a means (13) for measuring pattern width in the direction perpendicular to the direction of the patterns.