发明名称 Apparatus and method for determining power in plasma processing
摘要 An apparatus and method including a current sensor having a radiation emitter, such as an electrical resistor, and a radiation detector, such as an infrared detector, for sensing current flowing to a plasma generating electrode from a radio frequency (RF) power source. The resistor may include a high emissivity infrared coating to enhance efficiency of the current sensor. The infrared detector provides a highly accurate indication of the average or root-mean-square current delivered to the plasma generating electrode without introducing parasitic capacitance into the measurement, or sensing, circuit. A voltage sensor and a second current sensor, such as a torroidal current sensor, provide the voltage and phase angle of the current delivered to the plasma generating electrode to thereby permit calculation of the power delivered to the plasma generating electrode. A processor controls the RF source responsive to the sensed average current, sensed voltage, and sensed phase angle of the current.
申请公布号 US5273610(A) 申请公布日期 1993.12.28
申请号 US19920902972 申请日期 1992.06.23
申请人 ASSOCIATION INSTITUTIONS FOR MATERIAL SCIENCES, INC. 发明人 THOMAS, III, JOHN H.;SINGH, BAWA
分类号 H01J37/32;(IPC1-7):H01L21/00;C23C16/50 主分类号 H01J37/32
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