METHOD FOR DRY-WASHING CONTACT HOLES

摘要

PURPOSE: A method is provided to secure a reproductivity of a dry-washing process and to minimize a natural oxide and other pollution occurrence by applying an electric potential in reverse with sputtering for Ar+ ions to be blocked. CONSTITUTION: A flow of Ar gas is made of 1 to 7 mTorr in a reactor having dual RFelectric sources. A high frequency electric power source of 50-150W and a low frequency electric power supply of 100-300W are applied to form a plasma. A bias electric power supply is turned to -80 to -200V. The pressure of the reactor is reduced to 0.2 to 1mTorr to carry out a sputter washing. An electric potential opposed to a sputtering is applied to block Ar+ ions on the substrate, to thereby minimize damages to the substrate for an application of the mass production of actual devices.