发明名称 |
PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR INFRARED LASER EXPOSURE AND PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a photopolymerizable composition for near infrared laser exposure excellent in preservability, and a photopolymerizable planographic printing plate. SOLUTION: The photopolymerizable composition contains (A) an ethylenic monomer, (B) a photopolymerization initiating system which generates a radical in the light of 700-1,300 nm wavelength and (C) an amine compound having an atomic group [-N-CH2-] in its molecule. The photopolymerizable planographic printing plate is obtained by coating the top of a base with the photopolymerizable composition. |
申请公布号 |
JP2002202592(A) |
申请公布日期 |
2002.07.19 |
申请号 |
JP20010075248 |
申请日期 |
2001.03.16 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
TSURUYA YASUYUKI;TOSHIMITSU ERIKO |
分类号 |
G03F7/004;B41N1/14;G03F7/00;G03F7/029 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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