发明名称 PHOTOPOLYMERIZABLE COMPOSITION FOR NEAR INFRARED LASER EXPOSURE AND PHOTOPOLYMERIZABLE PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a photopolymerizable composition for near infrared laser exposure excellent in preservability, and a photopolymerizable planographic printing plate. SOLUTION: The photopolymerizable composition contains (A) an ethylenic monomer, (B) a photopolymerization initiating system which generates a radical in the light of 700-1,300 nm wavelength and (C) an amine compound having an atomic group [-N-CH2-] in its molecule. The photopolymerizable planographic printing plate is obtained by coating the top of a base with the photopolymerizable composition.
申请公布号 JP2002202592(A) 申请公布日期 2002.07.19
申请号 JP20010075248 申请日期 2001.03.16
申请人 MITSUBISHI CHEMICALS CORP 发明人 TSURUYA YASUYUKI;TOSHIMITSU ERIKO
分类号 G03F7/004;B41N1/14;G03F7/00;G03F7/029 主分类号 G03F7/004
代理机构 代理人
主权项
地址