| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an oblique illumination method to a reticle pattern, without improving an illumination optical system. SOLUTION: An exposure method for exposing a minute pattern, including a periodic pattern part of a first pitch PR on a substrate via an projection optical system, by irradiating an illumination light of a prescribed wavelength to a mask via an optical illumination system, comprises setting the coherence factor &sigma of an optical illumination system to be about less than 0.5, placing a diffraction grating pattern by a prescribed distance &Delta t, separated from the minute pattern toward the incidence side of the illumination light, deflecting the illumination light with the diffraction grating pattern, formed periodically with a second pitch PG which is about twice as long as the first pitch PR in substantially coincident direction as that of the periodic pattern, so as to have the illumination light irradiated to the minute pattern in a inclined manner with respect to the mask.</p> |
