| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide polarization illumination of an exposure apparatus with which resolution property can be enhanced, in exposure of gate lines, or the like, having strict dimensional rules, when a desired pattern is obtained by projection mapping that uses a phase shift mask. <P>SOLUTION: The exposure apparatus comprises a fly-eye lens array 304 arranged with fly-eye lenses in a matrix form, in order to equalize the intensity of light emitted from a light source, a rotation element array 302 consisting of a plurality of rotation elements for making the plane of vibration of passing light, arranged in correspondence with respective lens elements of the fly-eye lens array 304 rotate and having an optical axis parallel with the traveling direction of the light emitted from a light source, and a condenser lens 306 for irradiating a phase shift mask 308 with a light, having an orientation distribution of the plane of vibration in the plane of an equivalent light source via the fly-eye lens array 304 and the rotation element array 302, wherein the equivalent light source has a cross or radial cross shape and orientation distribution of the plane of vibration of light in the equivalent light source has a cross or radial cross shape. <P>COPYRIGHT: (C)2007,JPO&INPIT |
