发明名称 SAMPLE ANALYSIS DEVICE EQUIPPED WITH FOCUSING ION BEAM MACHINING/OBSERVATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a sample analysis device equipped with a focusing ion beam machining/observation apparatus capable of carrying out superb cross-section observation of a sample in a short time. SOLUTION: The sample analysis device is provided with an ion beam machining and observing apparatus 2 machining and observing the sample 6 by irradiating focusing ion beam on the sample 6, a vacuum evaporation device 3 equipped with an evacuation means for forming an evaporation film on the surface of the sample 6, a communication channel 4 communicating the focusing ion beam machining/observation apparatus 2 and the vacuum evaporation device 3 and moving the sample 6 between the focusing ion beam machining/observation apparatus 2 and the vacuum evaporation device 3 without breaking vacuum between the ion beam machining/observing apparatus 2, and the ion beam machining and observing apparatus 3, and a switching means 5 opening and closing the communication channel 4. With this, an evaporation film is laminated on the surface of the sample at the vacuum evaporation device and the sample 6 can be immediately moved to the focusing ion beam machining/observation apparatus 2. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006344508(A) 申请公布日期 2006.12.21
申请号 JP20050169596 申请日期 2005.06.09
申请人 FUJIFILM HOLDINGS CORP 发明人 YAEGASHI OSAMU;ARAI MASAO
分类号 H01J37/20;H01J37/28;H01J37/30;H01J37/317 主分类号 H01J37/20
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