| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pattern forming material superior in developability, tenting property of a cured film and adhesion superior also in peelability in etching and resolution, and capable of forming high-definition patterns, and to provide a pattern forming apparatus equipped with the pattern forming material and a pattern forming method that uses the pattern forming material. <P>SOLUTION: The pattern forming material includes at least a support and a photosensitive layer on the support, which photosensitive layer contains a binder, a polymerizable compound and a photopolymerization initiator, wherein the binder contains a urethane group-containing binder and a binder, having a structural unit derived from at least one of styrene and a styrene derivative. The pattern forming apparatus and the pattern forming method are also provided. The binder, having a structural unit derived from at least one of styrene and a styrene derivative, preferably has an I/O value of 0.35-0.65, and the content of the urethane group-containing binder is preferably 5-35 mass% with respect to the total amount of all binders. <P>COPYRIGHT: (C)2007,JPO&INPIT |
