| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a scanning exposure apparatus using a variable forming mask, the apparatus that can perform exposure with optimum resolution according to a pattern. <P>SOLUTION: The scanning exposure apparatus is equipped with a variable forming mask to form a desired pattern, a substrate stage PST to mount a photosensitive substrate P, and an exposure optical system L1 to L13 to expose the photosensitive substrate P to a light beam from the variable forming mask so as to transfer an image to the substrate, and functions to transfer a pattern by exposure to the photosensitive substrate P by relatively scanning the substrate stage PST and the variable forming mask, wherein the apparatus is equipped with a beam size varying means to vary the size of the light beam formed corresponding to each of a plurality of elements constituting the variable forming mask. <P>COPYRIGHT: (C)2007,JPO&INPIT |
