MINDESTENS ZWEISCHICHTIGES SUBSTRAT FÜR DIE MIKROLITHOGRAPHIE

摘要

As part of a flat mirror (10), a reflective layer (14) for reflecting electromagnetic radiation is applied as a functional layer to a two-layer substrate (11) with a base layer (12) and a covering layer (13). The base layer is ceramic/glass ceramic. The covering layer is silicon dioxide. Independent claims are also included for the following: (a) A method for producing a substrate for high-accuracy elements i.e. a plasma-enhanced/plasma-assisted/plasma-impulse chemical vapor deposition method; (b) and for a mask with a substrate according to the present invention with a layer to reflect extreme UV radiation and a layer to absorb extreme UV radiation.