| 发明名称 |
Method for fabricating integrated circuit features |
| 摘要 |
The present invention is directed to a method for conversion of an integrated circuit design into a set of masks for fabrication of an integrated circuit that optimizes use of an edge based image transfer mask process.
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| 申请公布号 |
US7346887(B2) |
申请公布日期 |
2008.03.18 |
| 申请号 |
US20050164076 |
申请日期 |
2005.11.09 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
LIEBMANN LARS W.;BEINTNER JOCHEN |
| 分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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