| 摘要 |
The substrate production apparatus monitoring system of the present invention comprises a data collection unit, a data storage unit, a control state identification unit, and a data evaluation unit. The data collection unit collects control parameter data from the substrate production apparatus including a subsidiary equipment. The control parameter data collected by the data collection unit are stored in the data storage unit. The control state identification unit identifies the control state of the substrate production apparatus based on the data in the data storage unit. The data evaluation unit evaluates the identified, individual control state as to whether it is abnormal/normal. In this way, any abnormal event in the apparatus even in the idle mode can be detected prior to the substrate processing, preventing reduction in the production yield.
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