发明名称 APPARATUS FOR SPUTTERING AND MANUFACTURING METHOD FOR FLAT DISPLAY DEVICE BY USING OF THE SAME
摘要 A sputtering device and a method for manufacturing a flat display device using the same are provided to reduce misjudgment of the short state due to other influences by inspecting a short state of a mask in a non-discharge state. A substrate support(120) fixes a substrate loaded to the inside of a vacuum chamber(110). A target part(130) includes a sputtering target(131) and a target support stand(132) supporting the target. A shield part(150) supports a mask(160). The shield part covers a part of the substrate support part and the sputtering target. The mask is separated from the substrate for surrounding the edge of the substrate. An insulating member(170) is used for coupling the shield part and the mask. The insulating member electrically insulates the mask from the shield part connected to the earth potential. A mask short detecting unit(180) detects the short state of the mask in the non-discharge state of the sputtering device.
申请公布号 KR20090062603(A) 申请公布日期 2009.06.17
申请号 KR20070129954 申请日期 2007.12.13
申请人 SAMSUNG MOBILE DISPLAY CO., LTD. 发明人 NAM, KYOUNG WON
分类号 H01L21/203 主分类号 H01L21/203
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