发明名称 |
SILICON SUBSTRATE FOR SOLAR CELL AND MANUFACTURING METHOD THEREFOR |
摘要 |
Disclosed are a silicon substrate for a solar cell and a method of manufacturing the same, wherein the reflectance of solar light can be decreased by gap-filling with AZO, and electrical properties, especially resistivity, can be reduced through e-beam irradiation, thus maximizing the cell efficiency and improving the electrical properties of AZO applied to a silicon solar cell. |
申请公布号 |
US2016163887(A1) |
申请公布日期 |
2016.06.09 |
申请号 |
US201414908461 |
申请日期 |
2014.06.03 |
申请人 |
KOREA INSTITUTE OF INDUSTRIAL TECHNOLOGY |
发明人 |
JEONG Chae Hwan;PARK Sung Jae;KIM Ho Sung |
分类号 |
H01L31/0236;H01L31/18;H01L31/0216;H01L31/028 |
主分类号 |
H01L31/0236 |
代理机构 |
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代理人 |
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主权项 |
1. A silicon substrate for a solar cell, configured such that a silicon substrate having a microwire structure is deposited with AZO (Al-doped ZnO) so as to gap-fill spaces between microwires with the AZO, and is irradiated with an e-beam. |
地址 |
Chungcheongnam-do KR |