SEMICONDUCTOR DEVICES WITH STRUCTURES FOR SUPPRESSION OF PARASITIC BIPOLAR EFFECT IN STACKED NANOSHEET FETS AND METHODS OF FABRICATING THE SAME

摘要

A device may include a nanosheet field effect transistor (FET) that may include a substrate, a well that is doped with impurities at a surface of the substrate, a channel including a plurality of stacked nanosheets, a gate, a conductive material, and an isolation layer. Ones of the plurality of stacked nanosheets may include a semiconductor material that may be doped with impurities of the same conductivity type as the impurities of the well. The conductive material may be adjacent the plurality of nanosheets and may electrically connect ones of the plurality of nanosheets to the well. The isolation layer may electrically insulate the well from the workfunction metal.

主权项

1. A device comprising a nanosheet field effect transistor (FET), the nanosheet FET comprising:
a well that is doped with impurities at a surface of a substrate; a channel comprising a plurality of stacked nanosheets on the well, ones of the plurality of stacked nanosheets comprising a semiconductor material that is doped with impurities of a same conductivity type as the impurities of the well and ones of the plurality of stacked nanosheets spaced apart from each other in a direction that is perpendicular to the surface of the substrate; a gate comprising a workfunction metal on the plurality of nanosheets, between adjacent ones of the plurality of nanosheets, and between the plurality of nanosheets and the well; a conductive material adjacent the plurality of nanosheets and that electrically connects ones of the plurality of nanosheets to the well; an isolation layer on the well that electrically insulates the well from the workfunction metal.