发明名称 |
SUBSTRATE SURFACE METALLIZATION METHOD AND SUBSTRATE HAVING METALLIZED SURFACE MANUFACTURED BY THE SAME |
摘要 |
A coating device for coating a coating liquid onto a substrate includes: a coating head having a coating-liquid outlet, adapted to move with respect to the substrate along a first axial direction and capable of coating the substrate with coating liquid through the coating-liquid outlet; and adjustment unit connected to the coating head and including a movable pad disposed proximal to the coating-liquid outlet and adapted to move along a second axial direction for adjusting the size of the opening of the coating-liquid outlet; and a drive assembly connected to the adjustment unit for controlling the adjustment unit to move along the second axial direction. Additionally a coating method is provided. |
申请公布号 |
US2016163567(A1) |
申请公布日期 |
2016.06.09 |
申请号 |
US201514957787 |
申请日期 |
2015.12.03 |
申请人 |
National Tsing Hua University |
发明人 |
WEI TZU-CHIEN;CHEN CHIH-MING;PAN TSENG-CHIEH;LAI KUEI-CHANG;WU CHUNG-HAN;CHEN KUEI-PO;OU NAI-TIEN;HUANG KUEI-WU |
分类号 |
H01L21/48;H01L29/06;H01L29/16 |
主分类号 |
H01L21/48 |
代理机构 |
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代理人 |
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主权项 |
1. A substrate surface metallization method, comprising:
providing a silicon substrate having a surface; modifying the surface of the silicon substrate by using at least one silane compound; depositing a plurality of colloidal nanoparticle groups to the surface of the silicon substrate, wherein the colloidal nanoparticle groups each include at least one palladium nanoparticle capped with at least one polymer; and electroless plating the surface of the silicon substrate to form an electroless metallic layer on the surface of the silicon substrate. |
地址 |
HSINCHU CITY TW |