THIN FILM DEPOSITION APPARATUS, METHOD FOR MANUFACTURING THIN FILM USING THE SAME AND METHOD FOR MANUFACTURING ORGANIC EL APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a thin film deposition apparatus capable of easily adjusting a temperature even when a large amount of heating or cooling is required for the temperature control of a base material in thin film deposition by a vacuum evaporation method and uniformly, accurately, stably controlling an in-plane temperature of the base material even when a large number of base materials are continuously deposited.SOLUTION: The thin film deposition apparatus includes a thin film deposition chamber including a temperature control plate. A base material holding member includes an inner peripheral portion fixing and holding a base material and an outer peripheral portion holding the inner peripheral portion in the outer periphery. The temperature control plate can control the temperature of the base material by contacting the non-thin film deposition surface of the base material, and the inner peripheral portion is independently movable to the outer peripheral portion.SELECTED DRAWING: Figure 3