ADAPTIVELY PLASMA SOURCE HAVING IMPROVED CD UNIFORMITY, AND PLASMA CHAMBER USING THE SAME

摘要

Disclosed are an adaptive plasma source having improved CD uniformity, and an adaptive plasma chamber using the same. The adaptive plasma source includes: an inner plasma source arranged in an inner region, and including an inner bushing and inner coils branched from the inner bushing and arranged in a spiral shape along a circumference of the inner bushing; an outer plasma source arranged in an outer region, and including an outer bushing and outer coils branched from the outer bushing and arranged in a spiral shape along a circumference of the outer bushing; an inner frame arranged to enclose the inner plasma source and having a plate structure; an outer frame arranged to enclose the outer plasma source and having a plate structure; an inner lifting lever mounted at the inner frame to be movable in the vertical direction, in which the inner frame is interlocked with the movement of the inner lifting lever in the vertical direction to move in the vertical direction; and an outer lifting lever mounted at the outer frame to be movable in the vertical direction, in which the outer frame is interlocked with the movement of the outer lifting lever in the vertical direction to move in the vertical direction.