| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist resin composition for glass etching having excellent etching accuracy.SOLUTION: A positive type photosensitive resin composition for glass etching comprises an alkali-soluble resin, a photosensitizer, a flat filler with an average particle diameter of 5 μm or less, and a polyfunctional epoxy compound.SELECTED DRAWING: None |
