SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD AND SUBSTRATE PROCESSING APPARATUS

摘要

Disclosed is a substrate cleaning device which rotates a substrate to contact a cleaning member to the rotating substrate so as to clean the substrate. The substrate cleaning device comprises: a self-cleaning member installed in an arm for supporting the cleaning member and configured to contact the cleaning member to self-clean the cleaning member; and a moving mechanism installed in the arm for supporting the cleaning member to move the self-cleaning member between a location where the self-cleaning member contacts the cleaning member and a location where the self-cleaning member is separated from the cleaning member.