发明名称 PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
摘要 <p>PURPOSE:To provide a photosensitive compsn. having reciprocity law failure characteristics, excellent photosensitive characteristics and excellent developability. CONSTITUTION:This photosensitive compsn. consists of a water-soluble azido compd. and a polymer of a vinyl monomer having a morpholino group, e.g. acryloylmorpholine or a copolymer of a vinyl monomer having a morpholino group with a water-soluble vinyl monomer, e.g. acrylamide. This photosensitive compsn. has reciprocity law failure characteristics in the presence of oxygen and is suitable for use in the production of the black matrix of a color cathode- ray tube.</p>
申请公布号 JPH0651509(A) 申请公布日期 1994.02.25
申请号 JP19920203418 申请日期 1992.07.30
申请人 HITACHI LTD 发明人 ITO MASAHITO;UTAKA SONOKO;MORISHITA HAJIME;HAYASHI NOBUAKI;ODAKA YOSHIYUKI;NISHIZAWA SHOKO
分类号 G03F1/00;G03F7/004;G03F7/008;G03F7/027;G03F7/038;G03F7/30;H01J9/14 主分类号 G03F1/00
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