| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve the light volume of a required interference pattern without raising the luminance of an optical source in a wavefront aberration measuring method using principles of shearing interference. <P>SOLUTION: The method of measuring the wavefront aberration includes the steps of arranging the point-like light source at the measuring object of the interest point of an optical system to be detected, making to carry out the shearing interference through the measuring flux of the light ejected from the point-like light source, and detecting the produced interference pattern with a detector. The line source constellation which consists of a plurality of independent line sources is arranged at the measuring object of the interest point describing above. To realize it, for example, a slit constellation (multi-slit) (S<SB>X</SB>, S<SB>Y</SB>) is formed on the slit member 12 arranged in the object side of the optical system to be detected. <P>COPYRIGHT: (C)2007,JPO&INPIT |
