PHOTORESIST COMPOSITION AND METHOD OF FORMING AND USING THE SAME,申请号USD3615952-传众专利搜索

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发明名称	PHOTORESIST COMPOSITION AND METHOD OF FORMING AND USING THE SAME
摘要
申请公布号	US3615952(A)	申请公布日期	1971.10.26
申请号	USD3615952	申请日期	1969.10.20
申请人	RCA CORP.	发明人	EDMUND BENJAMIN DAVIDSON
分类号	C08L67/00;B41C3/02;C08K5/00;C08L67/08;G03F7/032;G03F7/038;H01L21/027;H05K3/00;(IPC1-7):C23F1/02;G03C1/00	主分类号	C08L67/00
代理机构		代理人
主权项
地址

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VORRICHTUNG ZUR LAGEBESTIMMTEN LOESBAREN VERBINDUNG ZWEIER MASCHINENTEILE.

WASSERGEKUEHLTE BRENNKRAFTMASCHINE.

KREISELZETTWENDER.

PUFFERANORDNUNG FUER RESONANZ-SCHWINGMASCHINEN.

ZUSAMMENGESETZTER MASSSTAB.