发明名称 MASK CORRECTING DEVICE AND MASK CORRECTING METHOD
摘要 <p>PURPOSE:To provide a mask correcting device, etc., capable of suppressing the influence of diffraction of light and correcting defective parts with high accuracy. CONSTITUTION:Two sheets of L-shaped light shielding plates 10, 10 having phase plates 12 which vary phases of transmitted light by half wavelength each are combined along the inner peripheral parts to form a variable type slit 14. Light is passed in the variable slit 14 and part of the light passes the phase plates 12 when a pair of the L-shaped light shielding plates 10, 10 are irradiated with the light. The diffracted light infiltrating the phase plate 12 side of the L-shaped light shielding plates 10 is generated. The transmitted light of the phase plates 12 is, however, shifted in phase by the half wave length and, therefore, the transmitted light and the diffracted light are offset in energy. Then, the correction of the defective part K in the state free from the diffracted light is possible.</p>
申请公布号 JPH0792654(A) 申请公布日期 1995.04.07
申请号 JP19930233456 申请日期 1993.09.20
申请人 MITSUBISHI ELECTRIC CORP 发明人 CHIBA AKIRA
分类号 G03F1/68;G03F1/72;H01L21/027 主分类号 G03F1/68
代理机构 代理人
主权项
地址