PHOTOSENSITIVE LAMINATED STRUCTURE

摘要

PURPOSE:To obtain the titled structure having a superior antistatic property and superior properties of isolating oxygen and transmitting ultraviolet rays by laminating a photoresist layer on a specified stretched polyvinyl alcohol film. CONSTITUTION:An unstretched polyvinyl alcohol film having >=500 polymn. degree and >=98mol% saponification degree is uni- or biaxially stretched by >=1.5 times and heat-treated at >=150 deg.C to obtain a stretched polyvinyl alcohol film A having <=5cc/m<2>/24hr oxygen permeability at 20 deg.C and 65% RH and >=35% crystallinity. A photoresist layer B is laminated on the film A, or a film C such as a polyethylene film is further laminated to obtain a photosensitive laminated structure. After exfoliating the film C, the layer B is superposed on a metallic surface in close contact with each other, and it is exposed through the film A. The film A is then exfoliated, and the unexposed part of the layer B is dissolved and removed to develop the layer B.