发明名称 Semiconductor device having a semiconductor region in which either the conduction or valence band remains flat while bandgap is continuously graded
摘要 An improved semiconductor device such as an improved graded band gap transistor and an improved graded band gap diode, characterized by comprising a non-single-crystal material containing silicon atom, a band gap adjusting atom and a localized level reducing atom and having a region in which a band gap continuously graded at least one position other than junction position and only one of a conduction band and a valence band being continuously graded. It gives a significant improvement in both the frequency characteristic and the photoresponse.
申请公布号 US4887134(A) 申请公布日期 1989.12.12
申请号 US19870098791 申请日期 1987.09.21
申请人 CANON KABUSHIKI KAISHA 发明人 SAITO, KEISHI;FUJIOKA, YASUSHI
分类号 H01L21/324;H01L29/24;H01L31/109;H01L31/11;H01L31/20 主分类号 H01L21/324
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