发明名称 |
Semiconductor device having a semiconductor region in which either the conduction or valence band remains flat while bandgap is continuously graded |
摘要 |
An improved semiconductor device such as an improved graded band gap transistor and an improved graded band gap diode, characterized by comprising a non-single-crystal material containing silicon atom, a band gap adjusting atom and a localized level reducing atom and having a region in which a band gap continuously graded at least one position other than junction position and only one of a conduction band and a valence band being continuously graded. It gives a significant improvement in both the frequency characteristic and the photoresponse.
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申请公布号 |
US4887134(A) |
申请公布日期 |
1989.12.12 |
申请号 |
US19870098791 |
申请日期 |
1987.09.21 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SAITO, KEISHI;FUJIOKA, YASUSHI |
分类号 |
H01L21/324;H01L29/24;H01L31/109;H01L31/11;H01L31/20 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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