| 摘要 |
PURPOSE:To increase sensitivity by coating a substrate with a chemically sensitizable resist made of a mixture of a polymer with a photo acid generating agent, prebaking the resist and exposing the substrate to steam or vapor of alcohol. CONSTITUTION:A photo acid generating agent, e.g., triphenylsulfonium hexafluorophosphate reacts with a hydrogen donor, e.g., water contained in a resist under irradiation with light and generates proton acid by the catalytic action. In order to positively utilize the reaction with water, a resist film freed of the solvent by prebaking is moistened by keeping in steam for a while. A certain generating agent is liable to generate H<+> in the presence of alcohol and alpha-tosyloxy ethyl phenyl ketone easily generates sulfonic acid in an atmosphere of alcohol and can enhance sensitizing effect. |
