| 摘要 |
PURPOSE:To stabilize the exposure developing speed and to improve the resolution of a thick film pattern by providing a developer tank which can execute a development processing simultaneously with an exposure processing in the device. CONSTITUTION:A new developer is supplied and discharged into a developer tank 107 at a prescribed speed by a liquid supply pump 105. That is, as an exposure processing time elapses, a resist melting quantity into a developer increases. Since this melted resist has a light shielding operation, the light quantity irradiating an unexposed resist part is also changed with time. Simultaneously, since the resist meting quantity into a developer in the vicinity of an exposure part reaches a saturated state, the transmission light quantity also shows a saturation tendency, and an exposure developing speed decreases gradually. Therefore, by supplying uniformly a new developer to the whole surface of a sample at a constant speed by the liquid supply pump 105, the developer of the exposure part is always replaced with the new developer. In such a way, the light shielding operation of the resist melted in the developer can be prevented in advance, therefore, there is no change with time in the transmission light quantity, and the exposure developing speed is not saturated either. |
