| 摘要 |
PURPOSE:To obtain an excellent thin film exhibiting superconductivity without using a post-treatment such as oxygen annealing after the film-forming by bringing a substrate into contact with an oxygen ion conductor and forming a film e.g. by sputtering while generating oxygen. CONSTITUTION:An oxygen ion conductor 3 (e.g. stabilized zirconia) is made to contact a substrate 2 and electrical current is passed through the conductor with e.g. electrodes 4, 5. An oxide superconductor thin film is formed on the substrate 2 under generation of oxygen without passing through a gaseous phase. The film-forming is carried out by CVD process, sputtering process, vacuum evaporation process, ion cluster beam process, molecular beam epitaxy process or laser ablation process.
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