发明名称 RF PLASMA REACTOR
摘要 <p>A plasma reactor includes a pair of parallel plate electrodes (1, 2) one of which is grounded and the other driven, mounted within a chamber (8) which is connected via a port (8a) to a control device (16) for controlling the pressure of the gas within the chamber (8). The driven electrode (1) is connected to a voltage supply which has a driving frequency of 13.56 MHz, via an amplifier (9) and a superposed higher resonance frequency via a variable frequency power generator (11). With the plasma reactor resonance in the glow discharge between the electrodes (1, 2) can be generated thereby ensuring a greater coupling of the power in the system.</p>
申请公布号 WO1995008182(A1) 申请公布日期 1995.03.23
申请号 GB1994002027 申请日期 1994.09.16
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