发明名称 SEMICONDUCTOR SUBSTRATE, SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
摘要 PROBLEM TO BE SOLVED: To greatly reduce dislocations which pierce a compd. semiconductor crystal layer formed on a substrate. SOLUTION: A substrate A for a light emitting diode comprises a sapphire substrate 10, an undoped GaN buffer layer 11 formed thereon, and an n-type compd. semiconductor crystal layer 12 formed thereon. A device structure B of the light emitting diode comprises a first n-type GaN clad layer 13 having p-type electrodes 17 thereon, an undoped In0.2 Ga0.8 N active layer 14 and a second p-type GaN clad layer 15 having n-type electrodes 16 thereon, formed in this order on the crystal layer 12. Trapezoidal recesses 18 are formed at regions facing the electrodes 16 on the substrate 10, and an upper part 10a of each recess 18 has a thickness which is not greater than that of the first clad layer 13.
申请公布号 JPH10341036(A) 申请公布日期 1998.12.22
申请号 JP19980075295 申请日期 1998.03.24
申请人 MATSUSHITA ELECTRON CORP 发明人 HASHIMOTO TADAO;YURI MASAAKI;KONDO OSAMU;ISHIDA MASAHIRO
分类号 H01L21/20;H01L21/338;H01L29/812;H01L33/12;H01L33/32;H01L33/34;H01S5/00;H01S5/323 主分类号 H01L21/20
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