发明名称 |
DEVICE FOR PROCESSING SUBSTRATE |
摘要 |
PROBLEM TO BE SOLVED: To provide a device for processing a substrata which enable reduction of an installation area as far as possible and a smooth carry of a substrate between processing units. SOLUTION: In a device for performing a series of processed for each substrate, a group of coating units SC1 to SC3 are arranged in a shape of hook and a group of developing treatment units SD1 to SD3 are arranged in a shape of hook, and one unit at one end of the hook of the one group is arranged in the pocket region of the hook of the other group. Thereby the installation area of the device can be reduced. Further, since a substrate is carried with a substrate-carrying robot TRA into or out of the coating units SC1 to SC3 and first heat treatment units which process the substrates simultaneously and a substrate is carried with a substrate-carrying robot TRB into or out of the development treatment units SD1 to SD3 and second heat treatment units which process the substrates simultaneously, the substrate can be carried smoothly between the processing units. |
申请公布号 |
JPH11251399(A) |
申请公布日期 |
1999.09.17 |
申请号 |
JP19980047639 |
申请日期 |
1998.02.27 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
KOUGAKI KOUICHI;MAEDA MASASHI;CHIKAMORI RYUICHI;IWAMI MASAKI;OTANI MASAMI |
分类号 |
H01L21/677;H01L21/027;H01L21/68;(IPC1-7):H01L21/68 |
主分类号 |
H01L21/677 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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